Title | Processes | Material | Chamber Principle | Chamber Hardware | Supplier | Topic | |
---|---|---|---|---|---|---|---|
Arcing in gas distribution | MERIE | MxP | AMAT | Maintenance | ![]() | ||
Magnetic field failure | MERIE | MxP | AMAT | Maintenance | ![]() | ||
Etch rate depends on matchbox | MERIE | MxP+ | AMAT | Maintenance | ![]() | ||
Arcing indicated by collision rate | Hard Mask Open | Oxide Nitride Sandwich | Dual Frequency | SCCM Oxide | TEL | Maintenance | ![]() |
Increased first wafer effect after PM from chamber heating | Stack | Nitride / Oxinitride | Dual Frequency | SCCM Oxide | TEL | Maintenance | ![]() |