|The sensor installation is the
first operational step. The sensor type depends
on the etch or deposition chamber type.
The sensors are
manufactured using the same material (alloy) as used for the process chamber and the
surface is anodized (or coated with Y2O3). Commonly the sensor is qualified in the equipment using normal tool
qualification procedures, like particle test, metal contamination test,
etch rate test, and parameters of the main product.
The chamber must be down and properly vented before the sensor will be mounted. The sensor can be mounted during a preventive maintenance (wet clean).
|The plasma metrology system Hercules® uses a special sensor in a coaxial geometry (50 Ohms). The sensor head mounted flat in the chamber wall replacing view parts of the chamber; no changes at the chamber are necessary. The sensor behaves like a virtual part of the wall. The sensor head is grounded and so it does not influence the plasma or process conditions. The sensor behaves like a virtual part of the wall. The sensor measures RF current only, there is no influence of polymer ot other thin insulating layers on the measurement. The voltage between the chamber wall and the sensor electrode is less than 100 mV.|
|Disassembling of sensor or parts leads to loss
of warranty immediately. Please
follow the instructions below:
|The sensor catalog will be updated periodically.
Please note the Disclaimer and let us know if you miss a sensor.
In case of any questions or remaining problems please contact via:
phone: +49 30 63 92 50 44
Your Service Team.