Title | Processes | Material | Chamber Principle | Chamber Hardware | Supplier | Topic | |
---|---|---|---|---|---|---|---|
Process Stability Improvement on a Dual Frequency Etch Tool by Means of Plasma Parameters | Oxide | Dual Frequency | Excelan | LAM | Process Stability | ![]() | |
FDC and WAC enhancement using plasma parameters | CVD | Oxide | ICP | Excelan | LAM | Clean / Conditioning | ![]() |