| Title | Processes | Material | Chamber Principle | Chamber Hardware | Supplier | Topic | |
|---|---|---|---|---|---|---|---|
| Conditioning optimization | Hard Mask Open | Oxide Nitride Sandwich | Dual Frequency | SCCM Oxide | TEL | Clean / Conditioning | ![]() |
| Arcing indicated by collision rate | Hard Mask Open | Oxide Nitride Sandwich | Dual Frequency | SCCM Oxide | TEL | Maintenance | ![]() |
| Instable process - different levels in collision rate | Hard Mask Open | Oxide Nitride Sandwich | Dual Frequency | SCCM Oxide | TEL | FDC | ![]() |