| Title | Processes | Material | Chamber Principle | Chamber Hardware | Supplier | Topic | |
|---|---|---|---|---|---|---|---|
| Control of wet clean cycle by plasma parameters of dry clean | Polysilicon / a-Si | RIE | Clean / Conditioning | ![]() | |||
| Tool and chamber long term matching | Oxide | RIE | MxP+ | AMAT | Chamber Matching | ![]() | |
| Process Models for Gas Flow Reduction | Crystal Si | RIE | SPTS | Productivity | ![]() |