• APPLICATION DATABASE
    OTHER

    Chamber Hardware - HART

    Title Processes Material Chamber Principle Chamber Hardware Supplier Topic  
    E-chuck faultTrenchCrystal SiMERIEHARTAMATFDC
    Implementation of in-situ Measurement Techniques for Plasma ProcessingTrench Dual FrequencyHARTAMATProcess Stability
    Improved chamber temperature stabilityTrenchOxide Nitride SandwichMERIEHARTAMATClean / Conditioning
    Chamber matchingTrenchCrystal SiMERIEHARTAMATChamber Matching
    De-conditioning by test waferTrenchCrystal SiMERIEHARTAMATClean / Conditioning
    Improve of warm-upTrenchCrystal SiMERIEHARTAMATClean / Conditioning