Chamber Hardware - HART

Title	Processes	Material	Chamber Principle	Chamber Hardware	Supplier	Topic
E-chuck fault	Trench	Crystal Si	MERIE	HART	AMAT	FDC
Implementation of in-situ Measurement Techniques for Plasma Processing	Trench		Dual Frequency	HART	AMAT	Process Stability
Improved chamber temperature stability	Trench	Oxide Nitride Sandwich	MERIE	HART	AMAT	Clean / Conditioning
Chamber matching	Trench	Crystal Si	MERIE	HART	AMAT	Chamber Matching
De-conditioning by test wafer	Trench	Crystal Si	MERIE	HART	AMAT	Clean / Conditioning
Improve of warm-up	Trench	Crystal Si	MERIE	HART	AMAT	Clean / Conditioning