Material - Crystal Si

Title	Processes	Material	Chamber Principle	Chamber Hardware	Supplier	Topic
Process out of spec by corroded gas ring	Trench	Crystal Si	ICP	TCP®	LAM	Clean / Conditioning
Wet clean and conditioning check	Trench	Crystal Si	MERIE	HART TS	AMAT	Clean / Conditioning
E-chuck fault	Trench	Crystal Si	MERIE	HART	AMAT	FDC
Hard mask erosion	Trench	Crystal Si	MERIE		AMAT	Process Performance
Chamber matching	Trench	Crystal Si	MERIE	HART	AMAT	Chamber Matching
De-conditioning by test wafer	Trench	Crystal Si	MERIE	HART	AMAT	Clean / Conditioning
Improve of warm-up	Trench	Crystal Si	MERIE	HART	AMAT	Clean / Conditioning
E-H-Mode transition and its detection in SF6 plasma	Trench	Crystal Si	ICP	DPS	AMAT	Process Stability
Analysis of DT Etch Plasma Problems using a SEERS Plasma Sensor	Trench	Crystal Si	ICP	DPS	AMAT	FDC