Chamber Hardware - SCCM Oxide

Title Processes Material Chamber Principle Chamber Hardware Supplier Topic  
Conditioning optimizationHard Mask OpenOxide Nitride SandwichDual FrequencySCCM OxideTELClean / Conditioning
CD drift due to chamber heating Nitride / OxinitrideDual FrequencySCCM OxideTELProcess Performance
Arcing indicated by collision rateHard Mask OpenOxide Nitride SandwichDual FrequencySCCM OxideTELMaintenance
Instable process - different levels in collision rateHard Mask OpenOxide Nitride SandwichDual FrequencySCCM OxideTELFDC
Increased first wafer effect after PM from chamber heatingStackNitride / OxinitrideDual FrequencySCCM OxideTELMaintenance