• APPLICATION DATABASE
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    Chamber Hardware - DPS

    Title Processes Material Chamber Principle Chamber Hardware Supplier Topic  
    Dry clean and process stability improvement  ICPDPSAMATClean / Conditioning
    E-H-Mode transition and its detection in SF6 plasmaTrenchCrystal SiICPDPSAMATProcess Stability
    Chamber Matching of ICP Etch Chambers using RF Equipment ModelSTI ICPDPSAMATChamber Matching
    Process Stability in Photo Mask ManufacturingMetal EtchMetalICPDPSAMATProcess Stability
    Analysis of DT Etch Plasma Problems using a SEERS Plasma SensorTrenchCrystal SiICPDPSAMATFDC
    ICC Development and Characterization  ICPDPSAMATClean / Conditioning
    Implementation of a robust virtual metrology for plasma etchingGate etchOxideICPDPSAMATVirtual Metrology