Process Model

Depends on process and tool configuration

 














Plasma Model:
            - Capacitively Coupled Plasma (CCP)
                        - One generator one frequency
                        - Dual frequency two generators with two different frequencies
                                   (LAM Exelan, TELTM sccmTM)
            - Inductively Coupled Plasma (ICP-1)
                        - Two generators (coil and electrode) one frequency
                                   (LAM Kiyo, LAM 9400/9600, AVICA/SPTS Omega FxP, ...)
            - Inductively Coupled Plasma (ICP-2)
                        - Two generators (coil and electrode) two frequency
                                   (AMAT DPS / DPS+)

RF Characterization by means of RF Equipment model
            - Cable
            - Coil
            - Electrode system (Cathode)
→ provides boundary conditions for the plasma model