• PRODUCT GUIDE
    PLASMA PROCESS CONTROL
    EXPERIENCE & TRAINING
    RF TECHNOLOGY and PROCESS SERVICES
    REFERENCES
    OTHER

    HERCULES® ROADMAP AND HISTORY

    2021HERCULES®C HP
    		High-performance Hercules for VHF plasma chambers with increased bandwidth
    2019

    HERCULES®C smartM

    HERCULES®N smartM

    Universal plasma metrology with excellent cost to benefit ratio, covers almost all mainstream chamber applications

    2017SEERS model extensionSheath Heating and Plasma Asymmetry improve sensitivity and robustness of the parameter set in particular for low pressure applications in etch and PECVD
    2016New SEMI standard sensor interfaceSemi Standard E54.24 (GenSen)
    2012SAPC ServerStand alone APC/FDC software for one mainframe for small fabs and labs, collects tool and sensor data and provide a GUI for FDC and APC
    2010 N 250

    Universal plasma metrology 
    for medium pressure processes (PECVD);
    micro systems and photovoltaics
    2009
    		 N 60 Low cost plasma metrology
    for medium pressure processes (PECVD);
    micro systems and photovoltaics
    2008
    Q3    		 HERCULES®
    C 500 / 1000    		 Medium metrology system for
    manufacturing in mainstream fabs
    2008
    Q3    		 HERCULES®
    PMX 500 / 1000
    		 High end metrology system for process development and transfer
    2007 HERCULES® PMX Small high performance metrology for process development and manufacturing,
    Six data interfaces, SEMI E54
    2005 HERCULES® APC xM

    RF bandwidth 1 GHz for new tools

    such as TEL SCCM, Applied Materials® HART TS
    2003 HERCULES® APC High speed data acquisition
    PC tower size
    2002 HERCULES® PL+ First four-chamber system
    LotViewer for mass data analysis
    2000 HERCULES® PL First production line system
    Designed for 13.56 MHz plasmas