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    UNIFORMITY IMPROVEMENT OF ICP PROCESSES

      Principal root causes of non-uniformity
    • Preprocess and chamber state (memory effect)
    • Concentration of reactive species (chemistry)
    • The main reason of non-uniformity is an inhomogeneous magnetic flux (physics).

      Possible actions
    • Measurement of  RF B-field of ICP coils for chamber fingerprint
    • Reengineering measures for coil unit to improve uniformity
    Magnetic flux density B ICP etcher with three coils
    The magnetic field ICP etcher with three coils
    The diagram shows the non-uniformit in measured magnetic flux. The etch uniformity correlates with the B-field uniformity.