HERCULES® HiRes N

SENSOR for MEDIUM PRESSURE DEPOSITION

Hercules N

Product:

  • Hercules® HiRes N

Application:

  • Quality control
  • Process development
  • Product monitoring
  • Maintenance

Main parameters:

  • Plasma bulk resistance
  • Electron collision rate
  • RF current

Tools:

  • Medium pressure tools for Plasma Etch and Plasma Enhanced Chemical Vapor Deposition, up to 40.68 MHz generator frequency

Model:

  • NEED (Non-linear Extended Electron Dynamics) algorithm

Pressure range:

  • Lower limit: 60 Pa (500 mTorr)
  • Upper limit: 1 kPa (7.5 Torr)

Chamber setup:

  • Cylindrical geometry, capacitive coupling

Flexible and small:

  • 4.5 kg
  • H: 210 mm, D: 250 mm, W: 210 mm
  • 19" rack compatible

Subject to technical alternations!