DATA ANALYSIS by HercViewer and HercLotViewer

HercViewer 3.0

HercLotViewer 2.6

The main new features are:

• Detailed process and lot analysis
• First wafer effects
• Process instabilities
• Process excursions (arcing)
• Process influence after process mix (memory effects)
• Chamber status while conditioning procedure
• Process comparison by reference curve
• Improved step-wise analysis

The main new features are:

• Drift and instabilities within a lot or a wet clean cycle
• Step-wise analysis
• First wafer effects
• Process influence after process change (memory effects)
• Chamber and recipe comparison
• Pre-selection of the valid process length before loading data files
• Second parameter is shown additionally
• Time resolved curves and extended export function
• Diagrams ready for presentation

Dear Customers,

enclosed please find the new release
of HercView (3.0).
For download (9 MB) please click here: HercView

Please contact Plasmetrex GmbH for the new version of HercLotViewer.