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UNIFORMITY IMPROVEMENT of ICP PROCESSES

  Principal root causes of non-uniformity

  • Preprocess and chamber state (memory effect)
  • Concentration of reactive species (chemistry)
  • The main reason of non-uniformity is an inhomogeneous magnetic flux (physics).

  Possible actions

  • Measurement of  RF B-field of ICP coils for chamber fingerprint
  • Reengineering measures for coil unit to improve uniformity
Magnetic flux density B ICP etcher with three coils
The magnetic field ICP etcher with three coils
The diagram shows the non-uniformit in measured magnetic flux. The etch uniformity correlates with the B-field uniformity.