APPLICATION GUIDE APPLICATION DATA BASE SENSOR CATALOG DOWNLOAD
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PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Consulting Overview
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Spare Part Management
Uniformity Improvement
Large Area Uniformity Simulation
REFERENCES
Tool and Process
Hercules® Customers
Experience & Training
Partners
FAQs
Impressum
Company
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2016 © Plasmetrex GmbH

AVAILABLE SENSORS

Hercules® uses a special sensor in a coaxial geometry (50 Ohm) inserted into the wall (flange) of the recipient as a virtual part of the wall and does not influence plasma. Calibration depending on the sensor position is not necessary.

Sensors:

  • easy setup and installation for different tools.
  • insensitive to deposition insulating layers (polymers).
  • passive and removable internal plasma parameters.

Sensor Principle

    

The sensor is specifically depending on the etch and deposition tool.

Plasmetrex GmbH delivers sensors for

APPLIED MATERIALS® :

  • MxP™ , eMxP+™ , eMAX™ , SUPER e™,HART™,
    DPS™ 200 mm and 300 mm, CVD Ultima

LAM®:

  • TCP® 9X00 SE, TCP® 9X00 PTX, 2300™

Novellus:

  • SPEED

Standard flanges:

  • DN16, DN25, DN40 KF as well as CF
    (other sensors for special etch tools on request).
SENSOR DATA BASE: Please click here.