APPLICATION GUIDE APPLICATION DATA BASE SENSOR CATALOG DOWNLOAD
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PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Consulting Overview
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Spare Part Management
Uniformity Improvement
Large Area Uniformity Simulation
REFERENCES
Tool and Process
Hercules® Customers
Experience & Training
Partners
FAQs
Impressum
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2016 © Plasmetrex GmbH

HERCULES® ROADMAP AND HISTORY

Hercules® Roadmap

2010 N 250

Iniversal plasma metrology
for medium pressure processes (PECVD);
micro systems and photovoltaics

2009
N 60 Low cost plasma metrology
for medium pressure processes (PECVD);
micro systems and photovoltaics
2008
Q3
HERCULES®
C 500 / 1000
Medium metrology system for
manufacturing in mainstream fabs
2008
Q3
HERCULES®
PMX 500 / 1000
High end metrology system for process development and transfer
2007 HERCULES® PMX Small high performance metrology for process development and manufacturing,
Six data interfaces, SEMI E54

Hercules® History

2005 HERCULES® APC xM

RF bandwidth 1GHz for new tools
such as TEL SCCM, Applied Materials® HART TS

2003 HERCULES® APC High speed data acquisition
PC tower size
2002 HERCULES® PL+ First four-chamber system
LotViewer for mass data analysis
2000 HERCULES® PL First production line system
Designed for 13.56 MHz plasmas