APPLICATION GUIDE APPLICATION DATA BASE SENSOR CATALOG DOWNLOAD
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PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Consulting Overview
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Spare Part Management
Uniformity Improvement
Large Area Uniformity Simulation
REFERENCES
Tool and Process
Hercules® Customers
Experience & Training
Partners
FAQs
Impressum
Company
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2016 © Plasmetrex GmbH

First Wafer Effect

FDC

Pre-process Issuses

Chamber Matching

Process Development


Hercules® Products

Hercules PMX

Hercules C
Hercules N500
Hercules C
Hercules® PMX 500 / 1000 Hercules® C 500 / 1000 Hercules® N 60

Sensor heads for different etch and deposition tools
Data analyse with HercViewer or HercLotViewer
Data Coupling
with FAB host
Data Management by Hercules® Master


Sensor installation and base lining at least one wet clean cycle



Easy decision making, fast response to process faults,
saving tool up-time, test wafers, and spare parts


In case of tricky issues please use
the Plasmetrex process services around all plasma problems
including training of your employees.


Hercules® Products

DRAM

CPU

Manufacturing

Logic

Embedded

Manufacturing

Photovoltaic

Flat Panel

Manufacturing

Etch
(low pressure)1

Hercules® C 1000 Hercules® PMX 1000  

PECVD / HDP
(low pressure)1

Hercules® C 500 Hercules® C 500 Hercules® C 500

PECVD
(high pressure)2

Hercules® N 250 Hercules® N 250 Hercules® N 60

R & D
Etch and deposition

Hercules® PMX 1000 Hercules® PMX 500 Hercules® N 250

1 up to 35 Pa (250 mTorr)
2 60 Pa - 1 kPa (430 mTorr - 7.5 Torr)

Subject to technical alternations!