APPLICATION GUIDE APPLICATION DATA BASE SENSOR CATALOG DOWNLOAD
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PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Consulting Overview
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Spare Part Management
Uniformity Improvement
Large Area Uniformity Simulation
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Process Model

Depends on process and tool configuration

 














Plasma Model:
            - Capacitively Coupled Plasma (CCP)
                        - One generator – one frequency
                        - Dual frequency – two generators with two different frequencies
                                   (LAM® Exelan®, TELTM sccmTM)
            - Inductively Coupled Plasma (ICP-1)
                        - Two generators (coil and electrode) – one frequency
                                   (LAM® Kiyo®, LAM® 9400/9600, AVICA®/SPTS Omega FxP, ...)
            - Inductively Coupled Plasma (ICP-2)
                        - Two generators (coil and electrode) – two frequency
                                   (AMAT® DPS / DPS+)

RF Characterization by means of RF Equipment model
            - Cable
            - Coil
            - Electrode system (Cathode)
→ provides boundary conditions for the plasma model