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Plasma Control Concept
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RF Chamber Matching
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2016 © Plasmetrex GmbH

TRAINING CONCEPT

Courses:

 

The Plasmetrex Plasma Service Concept


Service and Consulting offered by Plasmetrex

Audience: 

  • Process, maintenance, or equipment engineers (plasma etching, PECVD, sputtering)

Target: 

  • Basic knowledge of plasma processing and RF technology for every day usage in semiconductor manufacturing

Two Course Lectures:

  • Quality, knowlegde, and experience of lectures is at least as important as the quality of the training manual.

Features:

  • Comprehensive training manual

  • Certificate

  • Short final test 

  • Course evaluation


Videos:

  • Space charge sheath (dark space): Formation and structures

  • Effect of parameter variation in plasmas:

  • RF power and pressure

  • Particle transport and removal

Experiment:

  • Plasma and magnetic field (video alternatively)

  • Live plasma experiment shows interaction with a static
    magnetic field by rotation of the plasma (Faraday effect).

Same principle as used in MERIE chambers as TEL™ DRM
and Applied Materials® - MxP family.