PRODUCT GUIDE

Hercules^® at a Glance

Semiconductor Plasma Process Sensor

Photovoltaics Plasma Process Sensor

Total Process Control Solution

PLASMA PROCESS CONTROL

Plasma Control Concept

Plasma Metrology

Data Handling

EXPERIENCE & TRAINING

Training Concept

Plasma School

RF TECHNOLOGY and PROCESS SERVICES

RF Chamber Matching

Uniformity Improvement

Large Area Uniformity Simulation

REFERENCES

Tool and Process

Hercules^® Customers

Experience & Training

Partners

FAQs

METROLOGY and PROCESS SERVICES

Company		Next Events
Plasma Control in Semiconductor and Solar Cell Manufacturing Our strengths lie in the expert advice and individual support. We strive continuously to find optimal solutions for your specific needs. We see ourselves not only as a manufacturer and supplier of plasma diagnostics, but also as a service provider and problem solver around the subject 'plasma'. more		AEC/APC Symposium XXII M.Klick, et al. Smart Spare Part Management and Chamber Matching in III-V Plasma Etching Renaissance Austin Hotel, Austin, Texas November 3-4, 2010 ISMI Symposium on Manufacturing Effectiveness M. Klick, et al. Quality Management and APC in Large Area PECVD Renaissance Austin Hotel, Austin, Texas November 3-4, 2010 more

Company

Next Events

Plasma Control in Semiconductor and Solar Cell Manufacturing

Our strengths lie in the expert advice and individual support.
We strive continuously to find optimal solutions for your specific needs.
We see ourselves not only as a manufacturer and supplier of plasma diagnostics, but also as a service provider and problem solver around the subject 'plasma'. more

AEC/APC Symposium XXII
M.Klick, et al.
Smart Spare Part Management and Chamber Matching in III-V Plasma Etching
Renaissance Austin Hotel, Austin, Texas
November 3-4, 2010

New Products
Photovoltaics Plasma Process Sensor Thin film processing, as hydrogenated amorphous silicon (α-Si:H), silicium nitride (Si₃N₄), and silicium oxide (SiO₂) is very sensitive to temperature, chamber clean, and seasoning. more

New Services
Large area uniformity simulation for a-Si layer thicknes The uniformity of the plasma is determined through three major effects. more	Measured a-Si layer thickness	Simulation