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Plasmetrex wishs you a Merry Christmas and a prosperous New Year
 
PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Photovoltaics Plasma Process Sensor
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Spare Part Management
Uniformity Improvement
Large Area Uniformity Simulation
REFERENCES
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2011 (c) Plasmetrex GmbH

PLASMA METROLOGY and PROCESS SERVICES


Company  
  Next Events
  • Plasma Control in Semiconductor and Solar Cell Manufacturing 

    Our strengths lie in the expert advice and individual support.
    We strive continuously to find optimal solutions for your specific needs.
    We see ourselves not only as a manufacturer and supplier of plasma metrology, but also as a service provider and problem solver around the subject 'plasma'. more

  • Semicon Japan

    Makuhari Messe, Tokyo
    December 7 - 9, 2011

  • Semicon Korea
      COEX, Seoul, Korea
      February 7 - 9,  2012

New Products  

  • Photovoltaics Plasma Process Sensor

    Thin film processing, as hydrogenated amorphous silicon (α-Si:H), silicium nitride (Si3N4), and silicium oxide (SiO2) is very sensitive to temperature, chamber clean, and seasoning.
    more
Hercules N
Plasma Metrology System Hercules®N60

New Services  

  • SMART SPARE PART MANAGEMENT by PLASMETREX' Hercules® and SAPC Server

    Any part in contact with the plasma impacts the process.
    Spare parts are a major cost driver.
    more
after PM
After PM
before PM

Before PM
  • Large area uniformity simulation for a-Si layer thicknes

    The uniformity of the plasma is determined through three major effects.
    more
Ariel Ben-Porath, Benny Shoham, BrightView systems

Measured a-Si layer thickness
Simulation Plasmetrex

Simulation