Plasma Metrology System Hercules ^(R)

Lean SPC Solution

for CCP or ICP RF Plasma Processes in High-Volume Production in Semiconductor and Solar Cell Manufacturing:

-       Etch & Deposition

-       Process Development

-       Quality Management

-       Equipment Health

The SAPC Server is a stand-alone, easy-to-use Statistical Process Control (SPC) solution with additional APC features.

-      Merges Sensor (Plasma Parameters) and Tool Data

-       Process Control through Plasma Parameters

-       Tool Hardware Control through Tool Parameters

-       Statistical Process Control in Real Time

Step-wise Limits defined for the Statistical Moments:

-       Warning on Screen

-       Error Message in log-file

-       Error Message via e-mail

-       HSMS command to Tool

Sensors for mainstream chambers available.

 Applicable for:

-       Chamber Matching

-       Fault Detection (by Plasma Parameters) and Classification (by Plasma and Tool Parameters)

-       Optimization of Conditioning

-       Process Development and Transfer

RF Technology & Process Services

Training & Consulting

RF Subsystem (from Generator to the Plasma)

-       RF Design

-       RF Re-design

-       RF Equipment Model → Improvement of RF Performance

-       RF Fault Detection and Classification by RF Parameters

Plasma Process Characterization

-       Improvement of Process Stability

-       Plasma induced Wafer Damaging

-       Process Transfer and Chamber Matching

RF School:

-       Industrial Radio Frequency Applications

Plasma School:

-       Plasma Physics Fundamentals

-       Process Fundamentals

-       Equipment:

-       Plasma Etch / Sputtering, Implantation / Plasma CVD

-       Process and Equipment Interaction

-       E-Chuck / Arcing / Conditioning

Consulting Overview