for CCP or ICP RF Plasma Processes in High-Volume Production in Semiconductor and Solar Cell Manufacturing: - Etch & Deposition - Process Development - Quality Management - Equipment Health |
The SAPC Server is a
stand-alone, easy-to-use Statistical Process Control (SPC) solution
with additional APC features. - Merges Sensor (Plasma Parameters) and Tool Data - Process Control through Plasma Parameters - Tool Hardware Control through Tool Parameters - Statistical Process Control in Real Time Step-wise Limits defined for the Statistical Moments: - Warning on Screen - Error Message in log-file - Error Message via e-mail - HSMS command to Tool |
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Sensors for mainstream chambers available. |
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Applicable for: - Chamber Matching - Fault Detection (by Plasma Parameters) and Classification (by Plasma and Tool Parameters) - Optimization of Conditioning - Process Development and Transfer |
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RF Subsystem (from Generator to the Plasma) - RF Design - RF Re-design - RF Equipment Model → Improvement of RF Performance - RF Fault Detection and Classification by RF Parameters Plasma Process Characterization - Improvement of Process Stability - Plasma induced Wafer Damaging - Process Transfer and Chamber Matching
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RF School: - Industrial Radio Frequency Applications Plasma School: - Plasma Physics Fundamentals - Process Fundamentals - Equipment: - Plasma Etch / Sputtering, Implantation / Plasma CVD - Process and Equipment Interaction - E-Chuck / Arcing / Conditioning
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